| abstract |
(57) [Abstract] [Purpose] To provide a photosensitive composition capable of stably forming a fine pattern having a rectangular cross section without forming an eaves on the surface. [Structure] Represented by the following general formula (I) It contains as an essential component a compound having a substituent capable of decomposing by an acid, a compound capable of generating an acid upon irradiation with light, and a silicon-containing amine compound represented by the following general formula (II). [Chemical 1] (In the formula, R 1 is a monovalent organic group, m is an integer of 0 or more, n is a positive integer, R 2 and R 3 are divalent organic groups, R 4 to R 7 each represent a monovalent organic group, and L represents a positive integer. ) |