| abstract |
[PROBLEMS] To provide an electron beam or X-ray resist composition having high sensitivity, high resolution, excellent PCD, and capable of giving an excellent rectangular pattern profile. SOLUTION: A positive type resin containing (a) a compound which generates an acid upon irradiation with an electron beam or X-ray, and (b) a resin having a group which is decomposed by the action of an acid and increases the solubility in an alkali developing solution. In an electron beam or X-ray resist composition, A positive electron beam or X-ray resist composition, wherein the compound generating an acid upon irradiation with an electron beam or X-ray contains a specific sulfonic acid ester and a specific onium sulfonate. |