http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010184327-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ccb2f721f6d2a7f79ce09d39998cea87
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filingDate 2009-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e94a0d6f75130f4516296993b0deac12
publicationDate 2010-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2010184327-A
titleOfInvention Polishing pad
abstract A polishing pad capable of stabilizing a foam shape and improving flatness of an object to be polished is provided. A polishing pad 10 has a foam sheet 2 made of urethane resin. The foam sheet 2 has a continuous foam structure formed by a wet film forming method. The foam sheet 2 contains an aggregate 5 in which the carbon black structures 9 are aggregated. Aggregate 5 is coated with an ABS resin as a dispersant. Aggregate 5 is limited to a dispersion state of 3.0 μm or less as measured by a grind gauge distribution method. The aggregate 5 is dispersed substantially uniformly without forming a large aggregate that is further aggregated during wet film formation. [Selection] Figure 1
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priorityDate 2009-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 31.