http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010184327-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ccb2f721f6d2a7f79ce09d39998cea87 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J9-28 |
filingDate | 2009-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e94a0d6f75130f4516296993b0deac12 |
publicationDate | 2010-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2010184327-A |
titleOfInvention | Polishing pad |
abstract | A polishing pad capable of stabilizing a foam shape and improving flatness of an object to be polished is provided. A polishing pad 10 has a foam sheet 2 made of urethane resin. The foam sheet 2 has a continuous foam structure formed by a wet film forming method. The foam sheet 2 contains an aggregate 5 in which the carbon black structures 9 are aggregated. Aggregate 5 is coated with an ABS resin as a dispersant. Aggregate 5 is limited to a dispersion state of 3.0 μm or less as measured by a grind gauge distribution method. The aggregate 5 is dispersed substantially uniformly without forming a large aggregate that is further aggregated during wet film formation. [Selection] Figure 1 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101800650-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015098271-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114619363-A |
priorityDate | 2009-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.