| abstract |
The problem to be addressed by the present invention is to provide a porous body with which cells are less readily closed up during dress processing or polishing. The present invention pertains to: a porous body characterized by being obtained by processing, by wet deposition, a urethane resin composition containing an organic solvent (B) and a urethane resin (A) obtained by reacting a polyol (a1) containing an aromatic polyester polyol (a1-1) in the range of 5 to 80 mass%, a polyisocyanate (a2), and a chain extender (a3); and to a polishing pad characterized by being obtained by dress-processing the porous body. This porous body can be used especially suitably as a polishing pad, enhances the polishing life and polishing rate, and makes it possible to reduce the added amount of carbon black used in order to enhance the wear performance during polishing, therefore making it possible to reduce scratching during polishing. |