http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010128369-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2008-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c948acfcbeab22955c6f55af02cfd166 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1b71d0b212b8a18ab126f3c3f2034a5 |
| publicationDate | 2010-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010128369-A |
| titleOfInvention | Positive resist composition and resist pattern forming method |
| abstract | A positive resist composition and a resist pattern forming method capable of forming a fine resist pattern in a good shape are provided. A positive resist composition comprising a base component (A) whose solubility in an alkaline developer is increased by the action of an acid, and an acid generator component (B) that generates an acid upon exposure, The base component (A) comprises a structural unit (a10) derived from hydroxystyrene, a structural unit (a11) having an aliphatic monocyclic group having a tertiary carbon in the side chain, and a tertiary carbon in the side chain. It contains a polymer compound (A1) having a structural unit (a12) having an aliphatic polycyclic group. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9057948-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8883396-B2 |
| priorityDate | 2008-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 321.