http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009534718-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2007-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009534718-A |
| titleOfInvention | Dry film photoresist resin composition for LDI |
| abstract | Provided is a dry film photoresist resin composition suitable for high sensitivity, particularly for LDI (appropriate exposure is 2 to 15 mJ / cm 2 or less) while maintaining basic physical properties at an appropriate level. A dry film photoresist resin composition for LDI containing a thioxanthone derivative as a photopolymerization initiator is used when laser direct exposure is used while maintaining the basic physical properties required for a resist at an appropriate level as in the prior art. Because exposure can be done with a small amount of exposure, productivity is significantly improved to produce images on manufacturers, PCBs, lead frames, PDPs, and other display elements where the speed of the exposure process affects the overall production speed. it can. [Selection figure] None |
| priorityDate | 2006-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 105.