http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009282491-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J11-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J179-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J5-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J163-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J4-00 |
| filingDate | 2008-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0371e5f71acbcd73720cfb4ea53d158 |
| publicationDate | 2009-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009282491-A |
| titleOfInvention | Photosensitive adhesive composition, photosensitive element using the same, method for forming resist pattern, and method for bonding bonded member |
| abstract | PROBLEM TO BE SOLVED: To provide a photosensitive adhesive composition having good developability, sufficiently high photosensitive characteristics, and excellent cured film adhesive strength and reliability, a photosensitive element using the same, and a method for forming a resist pattern And a method for bonding a member to be bonded. (A) A polybenzoxazole precursor represented by the following general formula (1), (B) a photopolymerizable compound having an ethylenically unsaturated group in the molecule, and (C) a photopolymerization initiator, , (D) an epoxy resin, and a photosensitive adhesive composition. [Chemical 1] (In general formula (I), U or V represents a divalent organic group, and at least one of U or V includes a group having an aliphatic chain structure having 1 to 30 carbon atoms, or at least one of U or V is And a group represented by general formula (II) (in general formula (II), R 1 and R 2 are each independently trifluoromethane, and a represents an integer of 1 to 30). [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013160899-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10428253-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012058339-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013068797-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011042775-A |
| priorityDate | 2008-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 63.