abstract |
A photosensitive adhesive composition having pattern forming properties with an alkali developer and sufficient re-adhesion after exposure, and an adhesive film, an adhesive sheet, an adhesive pattern, and a semiconductor device using the same provide. A photosensitive adhesive composition capable of forming a pattern by development, wherein the storage elastic modulus at 100 ° C. after pattern formation is 10 MPa or less. [Selection figure] None |