| abstract |
The present invention relates to a compound of formula (H) mM (R) n wherein M is a metal or metalloid and R is the same or different and is substituted or unsubstituted, saturated or unsaturated, at least one nitrogen. A heterocyclic group containing atoms, m is a value from 0 to less than the oxidation state of M, n is a value equal to the oxidation state from 1 to M, and m + n is a value equal to the oxidation state of M]. The present invention relates to an organometallic precursor compound represented, a method for producing the organometallic precursor compound, and a method for producing a film or coating from the organometallic precursor compound. |