| abstract |
A precursor and method for forming a silicon-containing film is provided. The following precursors of formula I are provided: R1 and R3 are each independently selected from an alkyl group, an alkenyl group, an alkynyl group, a dialkylamino group, an electron withdrawing group, and an aryl group, and R2 and R4 are hydrogen, an alkyl group, an alkenyl group, an alkynyl group, Each independently selected from a dialkylamino group, an electron withdrawing group, and an aryl group, and any one or all of R1 and R2, R3 and R4, R1 and R3, or R2 and R4 are bonded together; To form a ring selected from a substituted or unsubstituted aromatic ring or a substituted or unsubstituted aliphatic ring. [Selection figure] None |