http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008260272-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2255-26 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B17-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B15-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y30-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y20-00 |
| filingDate | 2008-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa3d7fa2250f50ea197596f657aaf79e |
| publicationDate | 2008-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008260272-A |
| titleOfInvention | Laminate, graft film forming method, graft pattern forming method, metal pattern forming method, printed wiring board, thin layer transistor, device, and photomask |
| abstract | An object of the present invention is to provide a laminate capable of producing a graft polymer with high sensitivity, and a method for forming a graft film or a graft pattern with high sensitivity using the laminate. A polymerization initiation layer formed by chemically bonding a base material, a compound having a radical polymerization initiation site and a site capable of direct chemical bonding to the base material to the base material, and an unsaturated site capable of radical polymerization. And a graft polymer precursor layer containing a compound having a compound capable of generating radicals upon heating or exposure in this order, and a whole surface having a wavelength of 360 nm to 700 nm with respect to the laminate. A graft film forming method and a graft pattern forming method, wherein exposure or imagewise exposure is performed, and a polymer having an unsaturated site capable of radical polymerization is directly bonded to the surface of the polymerization initiation layer to form a graft polymer. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017057782-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10525681-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018533191-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10187999-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017193487-A1 |
| priorityDate | 2007-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 397.