| abstract |
A gas barrier laminated film having excellent gas barrier properties without applying a primer treatment to a substrate film surface by continuously forming a gas barrier layer by catalytic vapor deposition and physical vapor deposition, and the film A manufacturing method is provided. An inorganic and / or organic thin film layer (A layer) having a thickness of 0.1 to 500 nm and an inorganic thin film layer (B layer) having a thickness of 0.1 to 500 nm are formed on at least one surface of a base film. ) Are sequentially formed, wherein the A layer is formed by catalytic chemical vapor deposition in which a material gas is contact pyrolyzed using a heated catalyst body, and the B layer is physical vapor deposition Gas barrier laminate film formed by [Selection figure] None |