http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012201658-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6bfdf49224a405be1f7b653c56ebad94 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-02 |
| filingDate | 2011-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06615a3175f5dbe915369e40eacca6a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43e0844be6c7a2b1937ab6ff698f1951 |
| publicationDate | 2012-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2012201658-A |
| titleOfInvention | Film forming material, film manufacturing method using the same, and use thereof |
| abstract | A mixture or reaction product of organoaluminum and an organosilane compound is formed by CVD and used for a sealing film or the like. An organoaluminum compound of the general formula (1) R 1 m AlX n (OR 2 ) 3- (m + n) (1) (In the formula, R 1 and R 2 are hydrocarbon groups having 1 to 20 carbon atoms, X is hydrogen or fluorine, m is a number from 1 to 3, and n is a number from 0 to 2.) And an organosilane compound of the general formula (2) R 3 p Si (OR 4 ) 4-p (2) (Wherein R 3 and R 4 represent a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms, and p represents an integer of 0 to 3) A carbon-containing aluminum oxide silicon oxide film is obtained by a chemical vapor deposition method using a mixture or a reaction product, and used for a sealing film, a gas barrier member, an FPD device, a semiconductor device, or the like. [Selection] Figure 1 |
| priorityDate | 2011-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 423.