| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_27209175d6886662dc2ec9ff7cd4b355
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f4d9d138d23c7ca8bfae3daf28b4eba0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d20d80324766ec2ec7f623cfa0258cc3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31504
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31678 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-352
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B33-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0676
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B9-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 |
| filingDate |
2012-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62b312334ca0fd9ba25e87788ee6ba6d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d6521388c0156628637117fdcd1ef18 |
| publicationDate |
2012-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2012133704-A1 |
| titleOfInvention |
Gas barrier laminate film, and method for producing same |
| abstract |
Provided is a gas barrier laminate film on which a dense inorganic thin-film layer is formed, and which inflicts little damage to a base film for forming an inorganic thin-film layer particularly to a resin film, and which exerts excellent gas barrier properties. Also provided is a productive method for producing said gas barrier laminate film. A gas barrier laminate film created by forming a plurality of layers of an inorganic thin-film layer on at least one surface of a base film, wherein the first layer to the nth layer (n being an integer of 1 or greater) of the inorganic thin-film layer on the base film is formed by means of a non-plasma film formation method and the n+1th layer formed on the aforementioned nth layer is formed by means of a facing target sputtering method. A method for producing a gas barrier laminate film created by forming one or a plurality of layers of an inorganic thin-film layer on at least one surface of a base film, wherein the first layer to the nth layer of the inorganic thin-film layer on the base film is formed by means of a non-plasma film formation method and the n+1th layer formed on the aforementioned nth layer is formed by means of a facing target sputtering method. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018111886-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017169029-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6151401-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10692708-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017179437-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014124816-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013168739-A1 |
| priorityDate |
2011-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |