http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008066253-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73ebc284a55d5daf0e209d6186c9e65c |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 |
| filingDate | 2006-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a17ba0706e3b25c73657bee39a84e17 |
| publicationDate | 2008-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008066253-A |
| titleOfInvention | Plasma processing equipment |
| abstract | A plasma processing apparatus capable of efficiently performing plasma processing is provided. A plasma processing apparatus (1) includes an application electrode (2), a pallet (first electrode) (4) having a work (100) and a function as a counter electrode of the application electrode (2), and a plasma processing gas. A gas supply means 11 for supplying, a first circuit (power supply unit) 8 for applying a voltage between the application electrode 2 and the pallet 4, and a lower surface 63 of the table 6 on which the pallet 4 is placed, 9 is arranged, and this vibrator 9 is configured to process the surface to be processed 110 of the workpiece 100 while vibrating the pallet 4 and the workpiece 100 integrally. Further, it is preferable that a standing wave in which a node is located on the processing target surface 110 is generated between the processing target surface 110 and the opposing surface 30 by the vibration of the vibrator 9. [Selection] Figure 1 |
| priorityDate | 2006-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 18.