http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008046408-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2006-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51fa0ce4d4abeeaeb492059877858d89 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02602d7bf4a6b83c0a7c1feabedae8f0 |
| publicationDate | 2008-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008046408-A |
| titleOfInvention | Resist pattern forming method, semiconductor device and manufacturing method thereof |
| abstract | ArF (argon fluoride) excimer laser light can also be used as exposure light during patterning, and a resist pattern can be stably thickened to a desired thickness without depending on its size. Providing a resist pattern forming method and the like that can easily and efficiently form a fine resist removal pattern that exceeds the exposure limit (resolution limit) of the light source of the exposure apparatus. A method for forming a resist pattern according to the present invention includes a coating step of applying a resist pattern thickening material 1 so as to cover a surface of the resist pattern after the formation of the resist pattern 3, and the resist pattern thickening. Including at least a baking step of baking the material and a developing step of developing and peeling off the resist pattern thickening material, and performing at least one of the coating step, the baking step, and the developing step a plurality of times. Features. [Selection] Figure 3 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011099903-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013545311-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017107188-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009110166-A1 |
| priorityDate | 2006-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 155.