| abstract |
Provided is a resist protective film material that can more reliably obtain a good rectangular resist pattern even when a protective film is formed on a photoresist film. A resist protective film material for forming a protective film on a photoresist film, the polymer compound comprising at least a repeating unit having at least one of a carboxyl group and an α-trifluoromethyl alcohol group And a resist protective film material containing an amine compound. [Selection figure] None |