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filingDate 2005-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2005-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005314662-A
titleOfInvention Polymer of top anti-reflective coating (TARC), method for producing the same, and composition of top anti-reflective coating including the same
abstract Variations in the width of a photoresist pattern due to variations in the thickness of the photoresist film, which are used in immersion lithography without being dissolved in water, and prevent multiple interference of light in the photoresist film during the formation of the photoresist pattern. Provided are a polymer of an upper antireflection film and a method for producing the same. Also provided are a composition of an upper antireflection film containing a polymer of the upper antireflection film and a pattern forming method using the same. The polymer of the upper antireflection film is represented by the following chemical formula 1, and has a weight average molecular weight of 1,000 to 1,000,000. In Chemical Formula 1, R1, R2, and R3 each represent hydrogen or a methyl group, and a, b, and c each represent 0.05 to 0.9 as the molar fraction of each monomer. [Chemical 1] [Selection figure] None
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