| abstract |
The present invention relates to an upper antireflection film capable of extending the depth of focus, an upper antireflection film forming composition for forming the upper antireflection film, and a pattern forming method using the upper antireflection film The purpose is to provide. (A) A polymer having a structural unit represented by the following general formula (1): A composition for forming an upper antireflection film, comprising (B) a tertiary amine compound having a hydroxyl group and (C) water. [Chemical 1] [In General Formula (1), R 1 represents a hydrogen atom or a methyl group. R 2 represents a direct bond, —CH 2 —, —COO-A—, or —CONH—A—, and A represents a divalent hydrocarbon group having 1 to 8 carbon atoms. ] [Selection figure] None |