http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007530797-A

Outgoing Links

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-509
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filingDate 2005-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2007-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007530797-A
titleOfInvention Method and apparatus for forming a metal layer
abstract Methods and processing tools are provided for forming a metal layer with improved morphology on a substrate. The method includes pretreating the substrate by exposing the substrate to a chemical species excited in plasma, exposing the pretreated substrate to a process gas containing a metal carbonyl precursor, and Forming a metal layer on the pretreated substrate by chemical vapor deposition. Metal carbonyl precursors include W (CO) 6 , Ni (CO) 4 , Mo (CO) 6 , Co 2 (CO) 8 , Rh 4 (CO) 12 , Re 2 (CO) 10 , Cr (CO) 6. , Or Ru 3 (CO) 12 , or any combination thereof, and the metal layer may each include W, Ni, Mo, Co, Rh, Re, Cr, or Ru, or any combination thereof.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013194247-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010067638-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011142288-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012102404-A
priorityDate 2004-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 28.