| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-822
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-04 |
| filingDate |
2008-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b51dc0f3f77078dc9b8a157af843b191
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90079b613e2c49f93b68aeab8c625d15 |
| publicationDate |
2010-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2010067638-A |
| titleOfInvention |
Ruthenium film formation method |
| abstract |
When a Ru film is formed on a dielectric film, a high quality ruthenium film can be formed by reducing the incubation time and generating nucleation at a high density. A method for forming a ruthenium film includes: generating plasma near a surface of a substrate to be processed carrying a dielectric film; modifying the surface of the dielectric film with the plasma; and modifying the dielectric film Supplying a ruthenium organometallic complex together with an inert carrier gas to the surface of the body film, and decomposing the organometallic complex, thereby forming a ruthenium film on the dielectric film. To do. [Selection] Figure 7 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107836034-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018516465-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7066929-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013194247-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107836034-B |
| priorityDate |
2008-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |