http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007273680-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
| filingDate | 2006-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7cf5ed2bb9f51004891e082dfb48740f |
| publicationDate | 2007-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007273680-A |
| titleOfInvention | Polishing composition and polishing method |
| abstract | A polishing composition having a high polishing rate and capable of suppressing dishing, and a polishing method using the polishing composition are provided. A polishing composition containing at least organic particles and inorganic abrasive grains, and having a property of being dissolved or swollen in water at a temperature lower than the lower critical eutectic temperature on at least a part of the surface of the organic particles. A polishing composition comprising a temperature-responsive polymer and having a lower critical eutectic temperature of 25 to 50 ° C., and a polishing method using the polishing composition. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015068672-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015046542-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10403321-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015046542-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110462797-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110462797-A |
| priorityDate | 2006-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 383.