http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015046542-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-8404 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2014-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2015046542-A1 |
| titleOfInvention | Glass substrate manufacturing method and magnetic disk manufacturing method |
| abstract | The present invention provides a method for producing a glass substrate for a magnetic disk and the like, which can further reduce the surface roughness of the main surface of the glass substrate as compared with the present. In the present invention, for example, a main surface of a glass substrate used for a magnetic disk is mirror-polished using a polishing liquid containing organic particles made of styrene resin, acrylic resin, or urethane resin as abrasive grains (final polishing (final) After the finish polishing, the surface roughness of the main surface of the substrate can be further reduced by cleaning the glass substrate with an organic cleaning agent. |
| priorityDate | 2013-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 86.