| abstract |
[Purpose] Removal of photoresist, its residue, organosiloxane antireflection film or shape protection film without corroding the material of the object to be processed, especially low dielectric constant film, Group 9 metal or its alloys and Group 11 metal Provided are a cleaning liquid and a cleaning method thereof. [Composition] 0.01 to 10% by weight of potassium hydroxide and / or sodium hydroxide, 5 to 80% by weight of water-soluble organic solvent, 0.0001 to 10% by weight of Group 9 metal or alloy thereof or Group 11 metal Treated with a cleaning solution consisting of a corrosion inhibitor and water. [Selection] Figure 1 |