http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007017976-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F30-392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F28-06 |
| filingDate | 2006-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_39fa21b66a27ec84514c75e1889e6fba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88ee237348ddf794ea55454180289a13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07585b1728e92f59e44d3f66331bd319 |
| publicationDate | 2007-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007017976-A |
| titleOfInvention | Method for forming a base layer composition, lithographic structure, material layer or material element comprising a heterocyclic aromatic structure used in a multilayer lithography process on a substrate |
| abstract | Provided is a base layer composition having optical properties that is compatible with common photoresists and can also be used as an ARC. A composition suitable for use as a planarizing substrate in a multi-layer lithography process is disclosed. The composition of the present invention comprises a polymer comprising a heterocyclic aromatic moiety. In another aspect, the composition further comprises an acid generator. In yet another aspect, the composition further comprises a crosslinker. The composition of the present invention provides a planarized base layer having excellent optical, mechanical and etch selective properties. The present invention relates to a lithographic structure comprising a base layer prepared from the composition of the present invention, a method of making such a lithographic structure, and using such a lithographic structure to pattern an underlying material layer on a substrate Including the method of [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010107790-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160002741-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9244353-B2 |
| priorityDate | 2005-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 54.