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filingDate 1991-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1993-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0545873-A
titleOfInvention Two-layer structure radiation-sensitive resist and method for producing the same
abstract (57) [Summary] [Structure] A two-layer structure radiation-sensitive resist, characterized in that a thin film containing a conjugated polymer as a main component is interposed between a substrate and the radiation-sensitive resist, and a method for producing the same. [Effect] According to the present invention, it is possible to prevent a change in shape from a desired resist pattern due to a variation in the thickness of the radiation-sensitive resist film due to the reflection of radiation on the substrate, and to provide a high manufacturing yield. At the same time, the allowable range of process conditions in the manufacturing process can be expanded.
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