http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006265724-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0934fdad04882b334ee9d8430485203b |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-452 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A47G9-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4551 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45544 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate | 2006-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb4bcd093e00c7f79cc8cb768255c813 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d01e0f2942f051582d4d9485cfccb161 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ce023107b9595729a4ce387be8a7f04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db10c4cb06e5122e8bc303f36d845884 |
| publicationDate | 2006-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2006265724-A |
| titleOfInvention | Atomic layer deposition apparatus using neutral beam and atomic layer deposition method using this apparatus |
| abstract | An atomic layer deposition apparatus using a neutral beam generated by irradiating a substrate to be processed with a flux of radicals generated by converting a second reactive gas into plasma, that is, an ion beam. An atomic layer deposition method using an apparatus is provided. A deposition method using a neutral beam deposition apparatus according to the present invention supplies a first reaction gas containing a substance that is not chemically adsorbed to a substrate to be processed into a reaction chamber loaded with the substrate to be processed. Forming a first reactant adsorbing layer containing a substance that is not chemically adsorbed on the substrate to be treated by chemical adsorption, and forming a first reactant on the substrate to be treated on which the first reactant adsorbing layer is formed. Irradiating a neutral beam generated by the reaction gas of 2 to remove a substance that is not chemically adsorbed on the substrate to be processed from the first reactant adsorbing layer to form a second reactant adsorbing layer; . By using the atomic layer deposition apparatus using the neutral beam and the atomic layer deposition method using the apparatus according to the present invention, the process can be performed without damage due to charging. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006351689-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015220443-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012138641-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012234950-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013540890-A |
| priorityDate | 2005-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 93.