| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate |
2001-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17d259e5856a7f1c610b3bde265a97ea
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fbe907db949dae7b648f61ffaae99969
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c77499bb17a75c6266165e6de69f06b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9e62e44f2988fbc7ab2fc2eeda0c817 |
| publicationDate |
2003-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003092291-A |
| titleOfInvention |
Substrate processing equipment |
| abstract |
(57) Abstract: A gas activated by remote plasma is carried on a substrate in an active state, and a thin film with high uniformity is formed on the substrate surface. A single-wafer substrate processing apparatus includes: a reaction tube for processing a substrate; a gas supply system for alternately supplying a gas not excited to the reaction tube and a gas to be excited; And a discharge tube 4 provided between the gas supply system 3 for supplying the gas to be excited and the reaction tube 1 and exciting the gas with plasma to generate active species. The pressure inside the discharge tube 4 is set so that the active species generated in the discharge tube 4 have a lifetime such that the active species reach the entire substrate W of the reaction tube 1 in an active state. The pressure is adjusted to be as low as the internal pressure. In order to adjust the pressure inside the discharge tube 4 to be as low as the pressure inside the furnace, it is preferable to use a straight discharge tube having the same inner diameter in the tube axis direction. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008300444-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012119706-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4533324-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004047157-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4734317-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2007037233-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006087893-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7291003-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2006087893-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006265724-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7919142-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4874984-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007505993-A |
| priorityDate |
2001-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |