| abstract |
PROBLEM TO BE SOLVED: To provide a hydrophobic porous film having a low dielectric constant, a low refractive index and a high mechanical strength, a method for producing the same, a precursor composition of a porous film for producing the porous film, a method for preparing the same, and Provision of a semiconductor device using this porous film. SOLUTION: Formula: Si (OR 1 ) 4 and R a (Si) (OR 2 ) 4-a (wherein R 1 represents a monovalent organic group, R represents a hydrogen atom, a fluorine atom or a monovalent group) R 2 represents a monovalent organic group, a is an integer of 1 to 3, and R, R 1 and R 2 may be the same or different. A porous membrane precursor composition comprising at least one compound selected from the group consisting of: a thermally decomposable organic compound exhibiting thermal decomposition at 250 ° C. or higher; a catalytic element; and an organic solvent. A porous film is prepared by performing a gas phase polymerization reaction with a hydrophobic compound using the solution of the precursor composition. A semiconductor device using this porous film. [Selection figure] None |