| abstract |
PROBLEM TO BE SOLVED: To provide a negative resist composition capable of suppressing mixing in a resist pattern forming method in which a dense pattern is formed in a lower layer and a sparse pattern is formed in an upper layer. The following steps (i) to (ii): (i) forming a first resist layer on a substrate using a first resist composition, and forming a dense pattern on the first resist layer (Ii) a step of forming a second resist layer on the first resist layer using a second resist composition and forming a pattern on the second resist layer. A negative resist composition used for the first or second resist layer, which is in contact with the resist layer formed from the negative resist composition. A negative resist composition dissolved in an alcohol-based organic solvent as the organic solvent (D) that does not dissolve the first or second resist layer. [Selection] Figure 1 |