| abstract |
(57) Abstract: Provided is a photosensitive composition having improved chemical resistance, improved developer latitude, and high sensitivity. SOLUTION: 1) A resin obtained by condensing a phenol component and aldehydes or ketones comprising the following (1) to (3), and in a 13 C-NMR spectrum of a deuterated dimethyl sulfoxide solution of the resin: , 23.0 A, 23.0 to 31.0 ppm When the integrated value up to 37.0 ppm is B, X = An alkali-soluble resin having an A / B value of X ≧ 0.6, 2) a dye having absorption in infrared light, 3) a compound capable of generating an acid upon irradiation with actinic light, 4) an acid And a compound having a group which can be decomposed by the above or a group which is crosslinked by an acid. Phenol component (1) Phenols 0 to 50 mol% (2) m-alkylphenols 20 to 80 mol% (3) p-alkylphenols 20 to 80 mol% |