| abstract |
In a method of coating a photoresist surface with a top coat, a resist film obtained by coating a resist film with a coating film that dissolves in a developing solution in a short time at the same speed in both exposed and non-exposed areas. Provide measures to shut off the environment or water. A polymer having at least one fluorocarbinol group, sulfonic acid group, fluoroalkylsulfonic acid group and carboxyl group which may be protected in the molecule and dissolved in an alkali developer is an alkane hydrocarbon. A method for producing a topcoat film for lithography, wherein the solvent is dissolved in an organic solvent containing 40% by weight or more and applied onto a photoresist film. [Selection figure] None |