| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b16f7c3780b586a8d76fd5cbba2cd475
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3e1c0e7e5dff6dc1c7499c88d44fd205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2c344db9d612bd49abbb8340eb3edf53 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2007-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a576da1f0e9c7ddf4a92ad0aaf71c634
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79d24b59df85c8048dbfa1dd7999950a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a614dfca9ffb346306889973c141e695 |
| publicationDate |
2013-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8507189-B2 |
| titleOfInvention |
Upper layer film forming composition and method of forming photoresist pattern |
| abstract |
An upper layer film forming composition for forming an upper layer film on the surface of a photoresist film includes (A) a resin dissolvable in a developer for the photoresist film and (B) a compound having a sulfonic acid residue group, the composition forming an upper layer film with a receding contact angle to water of 70° or more. The upper layer film forming composition of the present invention can form an upper layer film which has a sufficient transparency and is stably maintained without eluting the components into a medium without being intermixed with a photoresist film, can form a resist pattern with high resolution while effectively suppressing a defect, and can suppress a blob defect. |
| priorityDate |
2006-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |