| abstract |
PROBLEM TO BE SOLVED: To form an insulating film containing high-quality and high-purity lithium or an insulating film containing lithium silicate on the surface of various substrates by spin coater method, mist deposition method or CVD method A film forming material and a film forming method using the same are provided. An insulating film forming raw material comprising a lithium alkoxide compound and at least one organic solvent selected from ethers, ketones, esters, alcohols, and hydrocarbons. Alternatively, a raw material for forming an insulating film including a lithium alkoxide compound or lithium carboxylate, tetramethoxysilane or tetraethoxysilane, and an organic solvent is used. A film is formed using these raw materials. [Selection] Figure 3 |