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filingDate 1997-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3d0b963db94e89ed9271c86c1e10f93
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publicationDate 1998-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H10297908-A
titleOfInvention Method for producing coating liquid for forming dielectric coating, coating liquid for forming dielectric coating and method for forming dielectric coating
abstract (57) [Summary] [Problems] A method of forming a dielectric film by a sol-gel method has failed to form a dielectric film having excellent orientation. SOLUTION: [A] [B] O 3 (A is at least one element selected from lithium, sodium and potassium, and B is at least one element selected from niobium and tantalum) In a method of producing a coating liquid for forming a dielectric film containing a precursor of the dielectric material by hydrolyzing an organic compound containing each element constituting the dielectric material, the amount of the organic compound is preferably 1 mol. The hydrolysis treatment using 1 mol or less of water is repeated several times. This prevents the gelation of the organic compound due to excessive moisture during the hydrolysis treatment, while increasing the hydrolyzable amount in the whole hydrolysis treatment. And Gasification of organic groups is suppressed during baking of a coating film composed of the coating liquid for forming a dielectric film.
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