| abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive composition used in a semiconductor manufacturing process such as an IC, a circuit board such as a liquid crystal or a thermal head, and other photofabrication processes, a compound used in the photosensitive composition, and the photosensitive property. A pattern forming method using the composition, a photosensitive composition having improved exposure latitude and line edge roughness, a compound used in the photosensitive composition, and a pattern forming method using the photosensitive composition. A photosensitive composition containing a sulfonium salt having a specific structure, a sulfonium salt having a specific structure, and a pattern forming method using the photosensitive composition. |