| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24479 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D409-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D295-22 |
| filingDate |
2011-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_435d9c9b194a593797b0d757710778ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_075a3a80b789dfad4c9a83d380354072
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88bcabb3e0a0101711e37439a9856f96
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79a4c297fe26465f427b7bf18a643a56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aedee7414180fb2af1605aa79345b279 |
| publicationDate |
2012-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2012168293-A |
| titleOfInvention |
Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition |
| abstract |
An actinic ray-sensitive or radiation-sensitive resin composition having a large and excellent exposure latitude, capable of forming a good rectangular pattern shape, and having little elution into an immersion liquid during immersion exposure, and the composition Provided are a resist film and a pattern forming method. (A) A compound represented by the following general formula (I) that generates an acid upon irradiation with actinic rays or radiation, and (B) a resin whose solubility in an alkaline developer is increased by the action of the acid. An actinic ray-sensitive or radiation-sensitive resin composition. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7274937-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7285695-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018052832-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107870519-A |
| priorityDate |
2011-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |