http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016072169-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-64 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-19 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-17 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2015-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2016072169-A1 |
| titleOfInvention | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern formation method, and electronic device manufacturing method |
| abstract | The present invention relates to an actinic ray-sensitive or radiation-sensitive resin composition, an actinic ray-sensitive or radiation-sensitive film using the same, a mask blank provided with the film, a pattern forming method, and an electronic device including the pattern forming method And an electronic device manufactured by the electronic device manufacturing method. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention comprises (A) an onium salt compound containing at least one fluorine atom in the anion part and containing at least one nitrogen atom in the cation part, and (B ) An actinic ray-sensitive or radiation-sensitive resin composition containing at least one fluorine atom and containing a compound capable of generating an acid upon irradiation with an actinic ray or radiation, the compound (A) with respect to the total mass of the compound (A) ) In the compound (B) with respect to the total mass of the compound (B) is larger than the fluorine atom content in the compound (B). |
| priorityDate | 2014-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 224.