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filingDate 2001-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2004-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2004531749-A
titleOfInvention Photosensitive acid generator and photoresist containing them
abstract The present invention relates to novel photosensitive acid generator compounds (PAGs) and photoresist compositions containing these compounds. Specifically, the present invention relates to a light-sensitive acid generator compound that generates α, α-difluoroalkylsulfonic acid when exposed to radiation. Positive and negative chemically amplified resists containing such PAGs are particularly preferred. The present invention also includes a method for synthesizing such PAGs and α, α-difluoroalkylsulfonic acids.
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