abstract |
The present invention relates to novel photosensitive acid generator compounds (PAGs) and photoresist compositions containing these compounds. Specifically, the present invention relates to a light-sensitive acid generator compound that generates α, α-difluoroalkylsulfonic acid when exposed to radiation. Positive and negative chemically amplified resists containing such PAGs are particularly preferred. The present invention also includes a method for synthesizing such PAGs and α, α-difluoroalkylsulfonic acids. |