| abstract |
PROBLEM TO BE SOLVED: To provide a high-frequency plasma device capable of controlling the size of plasma and controlling the plasma density distribution in the radial direction. SOLUTION: A reaction chamber 1 into which a gas to be high-frequency plasma 10 is introduced, a magnet 3 provided outside the reaction chamber 1 to apply a magnetic field, and a plasma generation antenna 4 provided at an end of the reaction chamber 1 And a high-frequency oscillator 5 for applying high-frequency power to the antenna 4, wherein the magnetic field 3 formed in the reaction chamber 1 by the magnet 3 is a uniform magnetic field, a divergent magnetic field, a convergent magnetic field, or a cusp magnetic field. Either or a combination of any two or more of the magnetic fields. A high-frequency plasma device having a large volume, high plasma density, good plasma density distribution in the radial direction, and controllability can be realized. [Selection diagram] Fig. 1 |