http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101593540-B1

Outgoing Links

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-26513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-34
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317
filingDate 2009-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2016-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2016-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101593540-B1
titleOfInvention High density helicon plasma source for wide ribbon ion beam generation
abstract Discloses an ion source capable of generating a dense, wide ribbon ion beam using one or more helicon plasma sources. In addition to the helicon plasma source (s), the ion source also includes a diffusion chamber. The diffusion chamber has an extraction opening oriented along the same axis as the dielectric cylinder of the helicon plasma source. In one embodiment, dual helicon plasma sources located on opposite ends of the diffusion chamber are used to generate a more uniform extracted ion beam. In yet another embodiment, a multicusp magnetic field is used to further enhance the uniformity of the extracted ion beam.
priorityDate 2008-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004363090-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2244
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556224

Total number of triples: 26.