| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 |
| filingDate |
2003-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_977167a467d04d898c2ec940703de4eb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2659735b63ca975a440026ec8b41cca4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd62046dd55a988927c696dcd6fdf238 |
| publicationDate |
2004-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004361803-A |
| titleOfInvention |
Positive resist composition and method for forming resist pattern |
| abstract |
An object of the present invention is to provide a positive resist composition capable of improving a standing wave on a side wall of a resist pattern, and a pattern forming method using the positive resist composition. A positive resist composition comprising a resin component (A) whose alkali solubility is increased by the action of an acid and an acid generator component (B) that generates an acid upon exposure, wherein the component (A) is And a structural unit (a1) derived from hydroxystyrene and a structural unit (a2) derived from a (meth) acrylate represented by the following general formula (I), wherein the component (B) is: A positive resist composition comprising a diazomethane-based acid generator as a main component. Embedded image [Selection diagram] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009008788-A |
| priorityDate |
2003-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |