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filingDate 2003-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2004-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2004270022-A
titleOfInvention Method for producing thin film and thin film
abstract An object of the present invention is to provide a thin film of good quality when forming a thin film by generating discharge plasma using a source gas containing carbon atoms in a relatively high-pressure atmosphere of 100 Torr or more. A substrate is provided on at least one of opposed electrodes. By applying a pulse voltage between the counter electrodes 4 and 5 under an atmosphere containing a source gas A containing a carbon source and a pressure of 100 to 1600 Torr, discharge plasma is generated, and a thin film 7 is formed on the substrate 6. . The pulse duration of the pulse voltage is 10 to 1000 nsec. [Selection] Fig. 2
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