http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009242879-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-27
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filingDate 2008-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd023ba85a9f86c120760faa49dc59f0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4fe5efe4c42606f7a2ce7a1be4be1a19
publicationDate 2009-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009242879-A
titleOfInvention DLC deposition method
abstract A DLC film is generated at a higher deposition rate than in a vacuum while reducing the amount of carrier gas used. A DLC film forming apparatus includes a support electrode connected to a ground and supporting a substrate, and a mixed gas injection port that is provided at a position facing the support electrode and serves as a mixed gas injection port. A counter electrode 16, a gas injection head 21 having a barrier gas injection port 21 a which is provided next to the counter electrode 16 and is a barrier gas injection port, a chamber 20 including the support electrode 14 and the counter electrode 16, and the support electrode 14 And the counter electrode 16 are provided with a DC pulse generating circuit 22 having a pulse supply source for applying a DC pulse voltage. When the DLC film is generated, a mixed gas is injected from the mixed gas injection port 16a, a barrier gas is injected from the barrier gas injection port 21a, and a DC pulse voltage is applied to the support electrode 14. [Selection] Figure 1
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priorityDate 2008-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 32.