| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be055db3c1a09879df07379ba969e223 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E50-30 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2002-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b350e9372351829687b53625b4c546e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6996d2533b1342f3c297e36728a0309e |
| publicationDate |
2003-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003243369-A |
| titleOfInvention |
Plasma processing method and apparatus |
| abstract |
PROBLEM TO BE SOLVED: To provide a plasma processing method and apparatus in which dust is hardly generated and a stable etching rate can be obtained. SOLUTION: A first high-frequency power source is evacuated by introducing a predetermined gas from a gas supply device 2 into a vacuum vessel 1 by a pump 3 as an exhaust device, and keeping the inside of the vacuum vessel 1 at a predetermined pressure. 5. A high frequency power of 13.56 MHz is supplied to the coil 8 by the By supplying a high frequency power of 500 kHz to the coil 8 by 6, the deposition of the deposited film on the surface of the dielectric plate 7 is prevented while generating plasma in the vacuum vessel 1. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6013666-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10079133-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160138590-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011096689-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106463393-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106463393-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016114232-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2006073127-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101721431-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9591738-B2 |
| priorityDate |
2002-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |