Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9a1be0e5697d9ac3330ad2e40d26ae03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_930d026de3a6f8109fa00a85852fe8e4 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505 |
filingDate |
2002-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ddea149e5a2bb26e200ae1604800bfe6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10a3bd07455da919b74bb07bd59b0ce1 |
publicationDate |
2003-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2003223999-A |
titleOfInvention |
Plasma processing equipment |
abstract |
PROBLEM TO BE SOLVED: To stabilize the start of discharge by having a current detecting means for measuring a discharge current in a gap between electrode pairs during plasma discharge, and to monitor uniformity of discharge by using the current detecting means. Obtain a plasma processing apparatus. SOLUTION: A slit 35 extending along a flow path of a high-frequency current returning to the high-frequency power supply 1 is provided on a side wall 38 of a chassis 2 containing an impedance matching circuit 2A inserted between the high-frequency power supply 1 and a plasma excitation electrode 4. Two or more current detecting means 37, comprising a magnetic field probe 36 for detecting a magnetic field formed in the slit, are arranged axially symmetrically around the central axis XX of the chassis 2. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019046787-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100942071-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009543298-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013539159-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010123269-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008513940-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4727479-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007266365-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015517180-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7026578-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007294909-A |
priorityDate |
2002-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |