| abstract |
PROBLEM TO BE SOLVED: To prevent the formation of a hardly-solubilized layer for resist coating which does not affect a chemically amplified resist containing a water-soluble conductive polymer film material as a main component, and a hardly-solubilized material used in the method A layer formation preventing material is provided. A chemically amplified resist surface characterized by using a coating film forming material containing a water-soluble conductive polymer, fluorinated aliphatic sulfonic acid or fluorinated aromatic sulfonic acid, a basic compound and water. A method for preventing formation of a hardly-solubilized layer of a coating film to be coated, a material for preventing formation of a hardly-solubilized layer of a coating film to be coated on the surface of the chemically amplified resist used in the method, a method for forming a resist pattern including the method for preventing formation of a hardly-soluble layer, And a resist film-coated substrate manufactured by the method for preventing formation of a hardly soluble layer. |