| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_baeff680fc1e38b588f8625a48929dea
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d486b88b61cf259ff0fcb4d7d5d0a6d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bcf2cf60001cffd595e9c86808a39251
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_93eaf3421fc4f57e11d8b7529b29d23d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2005-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0fb62e58f74ea9d4cf7667bb6fcaca29
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6182f4304f457bfb67c04186cb32ed0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4a0702649f5912ea95ca377a53e41d7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_98dd63cc8a2330f00162c3693e1c3f96 |
| publicationDate |
2005-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2005117074-A1 |
| titleOfInvention |
Immersion liquid for immersion exposure process and method for forming resist pattern using such immersion liquid |
| abstract |
In an immersion exposure process, particularly in such an immersion exposure process wherein the resolution of a resist pattern in improved by performing an exposure while having a liquid with a certain thickness which has a higher refractive index than air intervene at least on a resist film in the path through which a lithography exposure light reaches the resist film, deterioration of the resist film and deterioration of the liquid in use during the immersion exposure are prevented at the same time, thereby enabling to form a high resolution resist pattern through immersion exposure. A liquid composed of a silicon-based liquid which is transparent to the exposure light used for the exposure process is used as an immersion liquid for the immersion exposure. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007140012-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007140012-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7745102-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006115268-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7771919-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7586103-B2 |
| priorityDate |
2004-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |