Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate |
2001-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c6788d846774f20e5ac920e2e11e3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61eb1b5009be47cb05392bb6e31476c3 |
publicationDate |
2002-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2002296779-A |
titleOfInvention |
Positive photoresist composition |
abstract |
(57) [Summary] (Problem corrected) [Problem] To provide a positive photoresist composition which has good resolution even for a contact hole pattern and a trench pattern and has small dependency on density in manufacturing semiconductor devices. . A resin that contains a specific repeating structural unit and increases the dissolution rate in an alkali developer by the action of an acid, a compound that generates an acid by irradiation with actinic rays or radiation, and a compound represented by the following general formula (CI): A compound represented by the general formula (CII), and a compound represented by the following general formula (CII) A positive photoresist composition comprising a dissolution inhibiting compound having a structure having at least one substituent containing a carboxylic acid group protected by an acid labile group on the polycyclic structure represented by I). . |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7544460-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013246203-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015041098-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7771911-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100852376-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005006078-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015056557-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007079552-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012073402-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9323152-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002311590-A |
priorityDate |
2001-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |