http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100852376-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2004-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100852376-B1 |
| titleOfInvention | Resist composition, laminated body, and resist pattern formation method |
| abstract | In the shrinkage process of shrinking by a process such as heating after forming a resist pattern, a resist composition capable of forming a good resist pattern is disclosed. Also disclosed is a laminate and a resist pattern forming method using the resist composition. This resist composition contains a resin component (A) in which alkali solubility changes under the action of an acid and an acid generator component (B) which generates an acid upon exposure. The said (A) component contains the structural unit guide | induced from (meth) acrylic acid ester, and shows the glass transition temperature in 120-170 degreeC range. |
| priorityDate | 2003-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 249.